NIKON Inspection Microscopes Large table (up to 300mm)
NIKON Inspection Microscopes Large table (up to 300mm)
Model: ECLIPSE L300N / L300ND
Brand: Nikon
Origin: Japan
概要
Advanced Semiconductor Microscopes for Inspecting the Latest Fabrications
Superb Nikon CFI60-2 optics provide excellent images to both eyepieces and also to Nikon’s digital imaging cameras with analysis software. Combining these superior optics with an extraordinary illumination system delivers images of excellent contrast and resolution.
Nikon ECLIPSE L300N(D) and L200N(D)
These microscopes are for exceptionally precise optical inspection of wafers (200mm for L200N series and 300mm for L300N series), reticules and other substrates.
Nikon CFI60-2 Optical Series
Nikon’s innovative design enables clear imaging techniques, including high contrast, brightfield, darkfield, polarisation (POL), differential interference contrast (DIC) and double beam interferometry optical contrast.
Nikon Digital Sight Cameras
The full range of Nikon’s Digital Sight cameras efficiently captures images of a sample and deliver them to the image processing software of the NIS-Elements suite, together with microscope data on the objective lens used, magnification setting and light intensity.
Integration of L200N and Wafer Loader NWL200
Nikon wafer loaders are well accepted and trusted in the semiconductor industry and many installations are in use today.
Product Highlights
Nikon CFI60-2 Optical Series
Nikon’s innovative design enables clear imaging techniques, including high-contrast, brightfield, darkfield, polarization (POL), differential interference contrast (DIC) and double beam interferometry optical contrast.
Universal Optical Contrast Methods
Reflected light: brightfield, darkfield, polarising (POL), differential interference contrast (DIC), epi-fluorescence and two-beam interferometry.
Transmitted light: brightfield, darkfield, polarising, differential interference contrast and phase contrast.
Intelligent Digital Communication
The microscope detects and controls the objective lens in use, light intensity, episcopic illumination and aperture via a USB connection to Nikon’s NIS-Elements software.
Ergonomic Design Concept
Optimal positioning of operator controls with variable angle eye-tube allows fatigue-free work.
A right-way-up, right-way-around image is provided for correctly observing raw materials, semiconductors and industrial components.
Specifications
| Base unit: | Maximum sample height: 38 mm (when used with LVNU5AI U5AI nosepiece and LV-S32 3x2 stage / LV-S64 6x4 stage) * 73 mm when used with one column riser 12V50W internal power source for dimmer, coarse and fine adjustment knobs Left: coarse and fine adjustment / Right: fine adjustment, 40 mm stroke Coarse adjustment: 14 mm/turn (with torque adjustment, refocusing mechanism) Fine adjustment: 0.1 mm/turn (1 ?m/graduation) Stage mounting hole intervals: 70 x 94 (fixed by 4-M4 screw) |
|---|---|
| Nosepieces: | C-N6 ESD Sextuple Nosepiece ESD LV-NU5 Universal Quintuple Nosepiece ESD LV-NBD5 BD Quintuple Nosepiece ESD LV-NU5I Intelligent Universal Quintuple Nosepiece ESD |
| Episcopic Illuminator: | LV-UEPI-N LV-LH50PC 12V50W Precentered Lamphouse Bright/darkfield switch and linked aperture stop (centerable), field diaphragm (centerable) Accepts ø 25 mm filter (NCB11, ND16, ND4), polarizer/analyzer, plate, excitation light balancer; equipped with noise terminator LV-UEPI2 LV-LH50PC 12V50W Precentered Lamphouse HG precentered fiber illuminator: C-HGFIE (with light adjustment) *option Bright/darkfield switch and linked aperture stop (centerable), field diaphragm (centerable), automated optical element switching feature matched to brightfield, darkfield, and epi-fluorescence switch Accepts ø 25 mm filter (NCB11, ND16, ND4), polarizer/analyzer, ? plate, excitation light balancer; equipped with noise terminator |
| Eyepiece tubes: | LV-TI3 trinocular eyepiece tube ESD (Erected image, FOV: 22/25) LV-TT2 TT2 tilting trinocular eyepiece tube (Erected image, FOV: 22/25) C-TB binocular tube (Inverted image, FOV: 22) P-TB Binocular Tube (Inverted image, FOV: 22) P-TT2 Trinocular Tube (Inverted image, FOV: 22) |
| Stages: | LV-S32 3x2 stage (Stroke: 75 x 50 mm with glass plate) ESD compatible LV-S64 6x4 stage (Stroke: 150 x 100 mm with glass plate) ESD compatible LV-S6 6x6 stage (Stroke: 150 x 150 mm) ESD compatible |
| Eyepieces: | CFI eyepiece series |
| Objective lenses: | Industrial Microscope CFI60-2/CFI60 optical system Objective lens series: Combinations in accordance with the observation method |
| ESD performance: | 1000 to 10V, within 0.2 sec. (excluding certain accessories) |
| Power consumption: | 1.2A/75W |
| Weight: | Approximately 8.6kg |
応用
Nikon ECLIPSE L300N(D) and L200N(D)
These microscopes are for exceptionally precise optical inspection of wafers (200mm for L200N series and 300mm for L300N series), reticules and other substrates.
Nikon CFI60-2 Optical Series
Nikon’s innovative design enables clear imaging techniques, including high contrast, brightfield, darkfield, polarisation (POL), differential interference contrast (DIC) and double beam interferometry optical contrast.
Nikon Digital Sight Cameras
The full range of Nikon’s Digital Sight cameras efficiently captures images of a sample and deliver them to the image processing software of the NIS-Elements suite, together with microscope data on the objective lens used, magnification setting and light intensity.
Integration of L200N and Wafer Loader NWL200
Nikon wafer loaders are well accepted and trusted in the semiconductor industry and many installations are in use today.
Product Highlights
Nikon CFI60-2 Optical Series
Nikon’s innovative design enables clear imaging techniques, including high-contrast, brightfield, darkfield, polarization (POL), differential interference contrast (DIC) and double beam interferometry optical contrast.
Universal Optical Contrast Methods
Reflected light: brightfield, darkfield, polarising (POL), differential interference contrast (DIC), epi-fluorescence and two-beam interferometry.
Transmitted light: brightfield, darkfield, polarising, differential interference contrast and phase contrast.
Intelligent Digital Communication
The microscope detects and controls the objective lens in use, light intensity, episcopic illumination and aperture via a USB connection to Nikon’s NIS-Elements software.
Ergonomic Design Concept
Optimal positioning of operator controls with variable angle eye-tube allows fatigue-free work.
A right-way-up, right-way-around image is provided for correctly observing raw materials, semiconductors and industrial components.
仕様
Specifications
| Base unit: | Maximum sample height: 38 mm (when used with LVNU5AI U5AI nosepiece and LV-S32 3x2 stage / LV-S64 6x4 stage) * 73 mm when used with one column riser 12V50W internal power source for dimmer, coarse and fine adjustment knobs Left: coarse and fine adjustment / Right: fine adjustment, 40 mm stroke Coarse adjustment: 14 mm/turn (with torque adjustment, refocusing mechanism) Fine adjustment: 0.1 mm/turn (1 ?m/graduation) Stage mounting hole intervals: 70 x 94 (fixed by 4-M4 screw) |
|---|---|
| Nosepieces: | C-N6 ESD Sextuple Nosepiece ESD LV-NU5 Universal Quintuple Nosepiece ESD LV-NBD5 BD Quintuple Nosepiece ESD LV-NU5I Intelligent Universal Quintuple Nosepiece ESD |
| Episcopic Illuminator: | LV-UEPI-N LV-LH50PC 12V50W Precentered Lamphouse Bright/darkfield switch and linked aperture stop (centerable), field diaphragm (centerable) Accepts ø 25 mm filter (NCB11, ND16, ND4), polarizer/analyzer, plate, excitation light balancer; equipped with noise terminator LV-UEPI2 LV-LH50PC 12V50W Precentered Lamphouse HG precentered fiber illuminator: C-HGFIE (with light adjustment) *option Bright/darkfield switch and linked aperture stop (centerable), field diaphragm (centerable), automated optical element switching feature matched to brightfield, darkfield, and epi-fluorescence switch Accepts ø 25 mm filter (NCB11, ND16, ND4), polarizer/analyzer, ? plate, excitation light balancer; equipped with noise terminator |
| Eyepiece tubes: | LV-TI3 trinocular eyepiece tube ESD (Erected image, FOV: 22/25) LV-TT2 TT2 tilting trinocular eyepiece tube (Erected image, FOV: 22/25) C-TB binocular tube (Inverted image, FOV: 22) P-TB Binocular Tube (Inverted image, FOV: 22) P-TT2 Trinocular Tube (Inverted image, FOV: 22) |
| Stages: | LV-S32 3x2 stage (Stroke: 75 x 50 mm with glass plate) ESD compatible LV-S64 6x4 stage (Stroke: 150 x 100 mm with glass plate) ESD compatible LV-S6 6x6 stage (Stroke: 150 x 150 mm) ESD compatible |
| Eyepieces: | CFI eyepiece series |
| Objective lenses: | Industrial Microscope CFI60-2/CFI60 optical system Objective lens series: Combinations in accordance with the observation method |
| ESD performance: | 1000 to 10V, within 0.2 sec. (excluding certain accessories) |
| Power consumption: | 1.2A/75W |
| Weight: | Approximately 8.6kg |
Catalogue